Scalable pattern matching between a pattern clip and a pattern library
    1.
    发明授权
    Scalable pattern matching between a pattern clip and a pattern library 有权
    模式剪辑和模式库之间的可扩展模式匹配

    公开(公告)号:US08718382B2

    公开(公告)日:2014-05-06

    申请号:US13363232

    申请日:2012-01-31

    CPC classification number: G06K9/68 G06T7/001 G06T2207/30148

    Abstract: A two-level matching technique is described. A system can generate a set of index patterns based on a set of library patterns in a pattern library. The pattern library can include patterns that are expected to have problems during manufacturing. Next, the system can use a fast matching process to check if a first-level pattern clip potentially matches one or more index patterns from the set of index patterns. If so, the system can use a detailed matching process to match a second-level pattern clip with library patterns that correspond to the one or more index patterns. Otherwise, the system can report that the first-level pattern clip does not match any library pattern in the pattern library.

    Abstract translation: 描述了两级​​匹配技术。 系统可以基于模式库中的一组库模式生成一组索引模式。 模式库可以包括预期在制造过程中出现问题的模式。 接下来,系统可以使用快速匹配过程来检查第一级模式剪辑是否潜在地匹配来自该组索引模式的一个或多个索引模式。 如果是这样,系统可以使用详细的匹配过程来将二级模式剪辑与对应于一个或多个索引模式的库模式相匹配。 否则,系统可以报告第一级模式剪辑与模式库中的任何库模式不匹配。

    SCALABLE PATTERN MATCHING BETWEEN A PATTERN CLIP AND A PATTERN LIBRARY
    2.
    发明申请
    SCALABLE PATTERN MATCHING BETWEEN A PATTERN CLIP AND A PATTERN LIBRARY 有权
    图案片段和图案库之间的可扩展图案匹配

    公开(公告)号:US20130195368A1

    公开(公告)日:2013-08-01

    申请号:US13363232

    申请日:2012-01-31

    CPC classification number: G06K9/68 G06T7/001 G06T2207/30148

    Abstract: A two-level matching technique is described. A system can generate a set of index patterns based on a set of library patterns in a pattern library. The pattern library can include patterns that are expected to have problems during manufacturing. Next, the system can use a fast matching process to check if a first-level pattern clip potentially matches one or more index patterns from the set of index patterns. If so, the system can use a detailed matching process to match a second-level pattern clip with library patterns that correspond to the one or more index patterns. Otherwise, the system can report that the first-level pattern clip does not match any library pattern in the pattern library.

    Abstract translation: 描述了两级​​匹配技术。 系统可以基于模式库中的一组库模式生成一组索引模式。 模式库可以包括预期在制造过程中出现问题的模式。 接下来,系统可以使用快速匹配过程来检查第一级模式剪辑是否潜在地匹配来自该组索引模式的一个或多个索引模式。 如果是这样,系统可以使用详细的匹配过程来将二级模式剪辑与对应于一个或多个索引模式的库模式相匹配。 否则,系统可以报告第一级模式剪辑与模式库中的任何库模式不匹配。

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