公开(公告)号：US20110084310A1

公开(公告)日：2011-04-14

申请号：US12863267

申请日：2009-01-19

申请人： Sylvain David ,  Philippe Boucaud ,  Fabrice Semond

发明人： Sylvain David ,  Philippe Boucaud ,  Fabrice Semond

IPC分类号： H01L21/20 ,  H01L29/20 ,  B05C11/00 ,  C23F1/08

CPC分类号： G02B6/1225 ,  B82Y20/00 ,  G02B6/131

摘要： A method of manufacture of a optical, photonic or optoelectronic component, including a so-called photonic slab or membrane that is traversed, in at least one internal region and according to a predetermined pattern, by a plurality of through openings having a micrometric or sub-micrometric transverse dimension, the method having the following steps: structuring of the surface of a substrate by an etching that produces holes in the substrate according to the pattern; depositing at least one layer of the photonic material forming the slab or membrane, by anisotropic epitaxial growth on the structured surface of the substrate around the opening of the holes.

摘要翻译： 一种制造光学，光子或光电子部件的方法，包括在至少一个内部区域中并根据预定图案被穿过的所谓的光子板或膜，所述多个通孔具有微米级或次级 该方法具有以下步骤：通过根据图案在衬底中产生孔的蚀刻来构造衬底的表面; 通过在孔的开口周围的基板的结构化表面上的各向异性外延生长沉积形成板或膜的至少一层光子材料层。