FLUORESCENCE MICROSCOPY IMAGING SYSTEM
    1.
    发明申请
    FLUORESCENCE MICROSCOPY IMAGING SYSTEM 有权
    荧光显微镜成像系统

    公开(公告)号:US20110284720A1

    公开(公告)日:2011-11-24

    申请号:US12872910

    申请日:2010-08-31

    CPC classification number: G02B21/16 G02B21/245

    Abstract: A fluorescence microscopy imaging system is used for detecting a fluorescence signal of a sample, and includes a module for detecting fluorescence and a module for focusing control. The module for detecting fluorescence includes a fluorescence excitation light source generator (FELSG) and a fluorescence detector. The FELSG is capable of generating an excitation light beam having a first wavelength to excite the sample to emit fluorescence. The fluorescence detector is used to read the fluorescence signal of the sample. The module for focusing control generates a servo light beam having a second wavelength. A servo light beam reflecting film disposed on an observation plane is used to reflect the servo light beam. A return beam signal is analyzed using a focusing detection method. An actuator is used to move the objective for focusing, so as to enable the fluorescence excitation light beam to excite the sample to emit fluorescence.

    Abstract translation: 荧光显微镜成像系统用于检测样品的荧光信号,并且包括用于检测荧光的模块和用于聚焦控制的模块。 用于检测荧光的模块包括荧光激发光源发生器(FELSG)和荧光检测器。 FELSG能够产生具有第一波长的激发光束以激发样品发射荧光。 荧光检测器用于读取样品的荧光信号。 用于聚焦控制的模块产生具有第二波长的伺服光束。 使用设置在观察平面上的伺服光束反射膜来反射伺服光束。 使用聚焦检测方法分析回波信号。 使用致动器来移动用于聚焦的物镜,以便使荧光激发光束能够激发样品以发射荧光。

    Fluorescence microscopy imaging system
    2.
    发明授权
    Fluorescence microscopy imaging system 有权
    荧光显微镜成像系统

    公开(公告)号:US08410414B2

    公开(公告)日:2013-04-02

    申请号:US12872910

    申请日:2010-08-31

    CPC classification number: G02B21/16 G02B21/245

    Abstract: A fluorescence microscopy imaging system is used for detecting a fluorescence signal of a sample, and includes a module for detecting fluorescence and a module for focusing control. The module for detecting fluorescence includes a fluorescence excitation light source generator (FELSG) and a fluorescence detector. The FELSG is capable of generating an excitation light beam having a first wavelength to excite the sample to emit fluorescence. The fluorescence detector is used to read the fluorescence signal of the sample. The module for focusing control generates a servo light beam having a second wavelength. A servo light beam reflecting film disposed on an observation plane is used to reflect the servo light beam. A return beam signal is analyzed using a focusing detection method. An actuator is used to move the objective for focusing, so as to enable the fluorescence excitation light beam to excite the sample to emit fluorescence.

    Abstract translation: 荧光显微镜成像系统用于检测样品的荧光信号,并且包括用于检测荧光的模块和用于聚焦控制的模块。 用于检测荧光的模块包括荧光激发光源发生器(FELSG)和荧光检测器。 FELSG能够产生具有第一波长的激发光束以激发样品发射荧光。 荧光检测器用于读取样品的荧光信号。 用于聚焦控制的模块产生具有第二波长的伺服光束。 使用设置在观察平面上的伺服光束反射膜来反射伺服光束。 使用聚焦检测方法分析回波信号。 使用致动器来移动用于聚焦的物镜,以便使荧光激发光束能够激发样品以发射荧光。

    Optical imaging device and optical sensor thereof
    3.
    发明申请
    Optical imaging device and optical sensor thereof 审中-公开
    光学成像装置及其光学传感器

    公开(公告)号:US20090161517A1

    公开(公告)日:2009-06-25

    申请号:US12071818

    申请日:2008-02-27

    CPC classification number: G11B7/0065 G11B7/131

    Abstract: An optical imaging device and an optical sensor thereof are described. The optical sensor is used for sensing a signal light. The optical sensor includes a plurality of photosensitive pixels and at least one absorption wall. The absorption wall is disposed between the photosensitive pixels, and a top of the absorption wall is higher than photosensitive surfaces of the photosensitive pixels. Herein, the photosensitive pixels are used for receiving an incident signal light, and the absorption wall is used for absorbing non-parallel light components in the signal light.

    Abstract translation: 描述了光学成像装置及其光学传感器。 光学传感器用于感测信号光。 光学传感器包括多个光敏像素和至少一个吸收壁。 吸收壁设置在感光像素之间,并且吸收壁的顶部高于感光像素的感光表面。 这里,光敏像素用于接收入射信号光,并且吸收壁用于吸收信号光中的非平行光分量。

    Method for making a substrate structure comprising a film and substrate structure made by same method
    4.
    发明申请
    Method for making a substrate structure comprising a film and substrate structure made by same method 审中-公开
    制造基片结构的方法,该基片结构包括通过相同方法制成的薄膜和基片结构

    公开(公告)号:US20100044827A1

    公开(公告)日:2010-02-25

    申请号:US12230076

    申请日:2008-08-22

    CPC classification number: H01L21/76254

    Abstract: A method for manufacturing a substrate structure comprising a film and a substrate structure made by this method are disclosed. The method for manufacturing a substrate structure comprising a film includes the steps of: providing a target substrate; providing an initial substrate; forming an embrittlement-layer on the initial substrate; forming a device layer on the embrittlement-layer; doping with hydrogen ions; bonding the device layer with the target substrate; and separating the device layer from the initial substrate. The hydrogen ions are added into the embrittlement-layer through doping, before an energy treatment is applied to embrittle and break the embrittlement-layer, thereby separating the device layer from the initial substrate. Since the hydrogen ions are added into the embrittlement-layer through doping, a crystal lattice structure of the device layer will not be damaged during the step of doping with hydrogen ions.

    Abstract translation: 公开了一种用于制造包括由该方法制成的薄膜和基片结构的基片结构的方法。 包括膜的基板结构的制造方法包括以下步骤:提供目标基板; 提供初始底物; 在初始基底上形成脆化层; 在脆化层上形成器件层; 用氢离子掺杂; 将器件层与目标衬底结合; 并将器件层与初始衬底分离。 在施加能量处理以脆化和破坏脆化层之前,通过掺杂将氢离子加入到脆化层中,从而将器件层与初始衬底分离。 由于通过掺杂将氢离子加入到脆化层中,在掺杂氢离子的步骤期间,器件层的晶格结构将不会被损坏。

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