公开(公告)号：US06487744B2

公开(公告)日：2002-12-03

申请号：US09946850

申请日：2001-09-04

申请人： Rüdiger Hunger

发明人： Rüdiger Hunger

IPC分类号： B08B1102

CPC分类号： H01L21/67046

摘要： A device for cleaning a wafer of abrasive agent suspension (slurry) remaining after polishing with brushes and DI water includes an upper gear casing having an upper side with an end, a motor in the upper gear casing, a drive shaft, an upper gear mechanism, and a lower gear casing substantially mirroring the upper gear casing. The lower receiving plate and upper receiving plate form a brush unit, between which a part of a wafer can be clamped and cleaned by rotating the brush unit. The lower gear mechanism turns the lower drive wheel in a same direction as the upper drive wheel. The cleaning is achieved by a rotational movement of a number of pairs of brushes (scrubber brushes) on both sides of the wafer and the application of deionized water.

摘要翻译： 用于清洗刷子和去离子水抛光后残留的研磨剂悬浮液（浆料）的晶片的装置包括：上齿轮壳体，其具有一端部的上侧，上齿轮壳体中的马达，驱动轴，上齿轮机构 ，以及基本上与上部齿轮箱体相反的下部齿轮箱。 下接收板和上接收板形成刷单元，在其之间可以通过旋转刷单元来夹持和清洁晶片的一部分。 下齿轮机构使下驱动轮沿与上驱动轮相同的方向转动。 清洁是通过在晶片的两侧和去离子水的应用上的多对刷子（洗涤刷）的旋转运动来实现的。

公开(公告)号：US06804851B2

公开(公告)日：2004-10-19

申请号：US10134893

申请日：2002-04-29

申请人： Matthias Fehr ,  Rüdiger Hunger ,  Thomas Mieth

发明人： Matthias Fehr ,  Rüdiger Hunger ,  Thomas Mieth

IPC分类号： A47L1500

CPC分类号： H01L21/67046 ,  B08B1/04 ,  Y10S134/902

摘要： A holder in a brush-cleaning installation, preferably for combined use in the brush-cleaning and centrifugal-drying process, contains a carrier part from which there extend, in a spider-shaped manner, a plurality of carrying arms. On the carrying arms there is mounted, in a rotatable manner in each case, a guide roller which, in addition to positioning the semiconductor wafer vertically, also makes it possible for the semiconductor wafer to be positioned horizontally with the aid of an annular collar on a bottom section of the guide roller.

摘要翻译： 刷子清洁装置中的保持器，优选用于刷洗和离心干燥过程中的组合使用，包括载体部分，其以蜘蛛状方式延伸多个携带臂。 在承载臂上，在每种情况下以可旋转的方式安装引导辊，除了将半导体晶片垂直定位之外，还可以借助于环形套环水平定位半导体晶片 导辊的底部。

公开(公告)号：US06250141B1

公开(公告)日：2001-06-26

申请号：US09436600

申请日：1999-11-09

申请人： Stefan Geyer ,  Michael Horn ,  Rüdiger Hunger

发明人： Stefan Geyer ,  Michael Horn ,  Rüdiger Hunger

IPC分类号： G01N1902

CPC分类号： H01L22/12

摘要： A scanning device for semiconductor wafers with which rapid and dependable scanning is permitted. The invention is characterized by a base plate with a guiding pin protruding from it for the manual guidance of a depositing plate which is displaceable on the latter. The depositing plate is intended to receive a semiconductor wafer and is provided on an underside with meandering guiding channels for guiding by the guiding pin. A liquid drop is kept on a surface of the semiconductor wafer by a scanning tube and collects metal and dopant traces from the semiconductor wafer. The liquid drop can then be analyzed for determining a purity of the surface of the semiconductor wafer.

摘要翻译： 一种用于半导体晶片的扫描装置，可以进行快速可靠的扫描。 本发明的特征在于具有从其突出的引导销的底板，用于手动引导可在其上移动的沉积板。 沉积板旨在接收半导体晶片，并且设置在下侧，具有用于由引导销引导的曲折引导通道。 通过扫描管将液滴保持在半导体晶片的表面上，并从半导体晶片收集金属和掺杂物迹线。 然后可以分析液滴以确定半导体晶片的表面的纯度。