Pellicle
    1.
    发明授权
    Pellicle 失效
    薄膜

    公开(公告)号:US06960381B2

    公开(公告)日:2005-11-01

    申请号:US10634877

    申请日:2003-08-06

    摘要: A pellicle is used for a photolithographic patterning process using a light having a wavelength of from 100 to 200 nm. The pellicle contains a pellicle membrane containing (A) a substantially linear fluoropolymer which has an alicyclic structure in its main chain, the main chain being a chain of carbon atoms, and the fluropolymer satisfying the following requirements (1) the carbon atoms in the main chain of the fluoropolymer contain a carbon atom having at least one hydrogen atom bonded thereto and a carbon atom having no hydrogen atom bonded thereto; and (2) in the measurement of a high resolution proton magnetic resonance spectrum of the fluoropolymer, a number of hydrogen atoms based on signals appearing on the higher magnetic field side higher than 2.8 ppm, is at most 6 mol % based on a total number of hydrogen atoms.

    摘要翻译: 将防护薄膜组件用于使用波长为100至200nm的光的光刻图案化工艺。 防护薄膜组件包含一种防护薄膜组件,其含有(A)基本上为直链的含氟聚合物,其主链具有脂环结构,主链为碳链,氟聚合物满足以下要求(1)主要碳原子 含氟聚合物的链含有具有与其键合的至少一个氢原子的碳原子和与其结合的不具有氢原子的碳原子; 和(2)在含氟聚合物的高分辨率质子磁共振谱的测定中,基于高于2.8ppm的较高磁场侧出现的信号,基于总数多至6mol%的氢原子数 的氢原子。