公开(公告)号：US20060246234A1

公开(公告)日：2006-11-02

申请号：US11407691

申请日：2006-04-19

申请人： Douglas Meyers ,  Rahul Ganguli ,  Troy Robinson ,  Robert Gump ,  Steven Colbern ,  Fikret Kirkbir

发明人： Douglas Meyers ,  Rahul Ganguli ,  Troy Robinson ,  Robert Gump ,  Steven Colbern ,  Fikret Kirkbir

IPC分类号： G03F1/14

CPC分类号： G03F1/64 ,  G03F7/70933 ,  G03F7/70983 ,  Y10T428/24793 ,  Y10T428/3154 ,  Y10T428/31544

摘要： A photomask assembly is disclosed having a photomask substrate and a composite pellicle frame that includes both a metallic frame component and a scavenger component. The metallic frame component has a cross-sectional thickness of at least 100 micrometers in all directions, and the volume percentage of the scavenger component relative to the overall volume of the composite frame is in the range of 0.1 to 95%. The scavenger component has a gas permeability to oxygen or nitrogen greater than about 10 ml·mm/cm2·min·MPa, an average pore size between 0.001 and 10 micrometers, and a pore surface area greater than 10 m2/g. This configuration enables the pellicle frame to have sufficient strength to withstand stresses encountered during normal use, yet also to have the capability of scavenging impurity molecules from the space adjacent to the photomask substrate. In a separate and independent feature of the invention, the scavenger component comprises at least one metal oxide selected from the group consisting of oxides of aluminum, boron, cerium, cobalt, copper, erbium, hafnium, lanthanum, neodymium, praseodymium, scandium, silicon, titanium, yttrium, zirconium, and mixtures thereof. Preferably, the metal oxide is an oxide of zirconium, yttrium, or mixtures thereof.

摘要翻译： 公开了一种光掩模组件，其具有光掩模基板和包括金属框架部件和清除部件的复合防护薄膜框架。 金属框架部件在所有方向上具有至少100微米的横截面厚度，并且清除剂部件相对于复合框架的总体积的体积百分比在0.1至95％的范围内。 清除剂组分对氧气或氮气的气体渗透性大于约10毫升/厘米3·秒/秒/秒·秒·分钟·MPa，平均孔径为0.001〜10微米，孔表面积大于 10微克/克。 这种构造使得防护薄膜框架具有足够的强度以承受在正常使用期间遇到的应力，而且还具有从邻近光掩模基板的空间中清除杂质分子的能力。 在本发明的独立和独立的特征中，清除剂组分包括选自铝，硼，铈，钴，铜，铒，铪，镧，钕，镨，钪，硅的氧化物中的至少一种金属氧化物 ，钛，钇，锆及其混合物。 优选地，金属氧化物是锆，钇或其混合物的氧化物。