公开(公告)号：US20060021961A1

公开(公告)日：2006-02-02

申请号：US11187346

申请日：2005-07-21

Applicant: Joerg Muchow ,  Torsten Ohms ,  Volkmar Senz ,  Guenther-Nino-Carlo Ullrich ,  Ronald Gampp

Inventor： Joerg Muchow ,  Torsten Ohms ,  Volkmar Senz ,  Guenther-Nino-Carlo Ullrich ,  Ronald Gampp

IPC: C23F1/00 ,  B44C1/22

CPC classification number: B81B3/0072 ,  B81B2203/0127

Abstract: A method and a micromechanical component which counteract manufacturing-process-related mechanical stresses in the membrane are provided. The membrane is formed on a substrate in a layer system and spans a cavity in the substrate. The layer system includes at least one base layer formed on the substrate for circuit elements. At least one structured masking layer is also formed on the base layer for defining the circuit elements. The masking layer is structured in the area of the membrane in such a way that mechanical stresses acting in the area of the membrane under vacuum are at least partially compensated, the intrinsic stress of the masking layer being taken into account in the layout of the structuring.

Abstract translation: 提供了一种抵抗膜中与制造过程相关的机械应力的方法和微机械部件。 膜在层系统中的基底上形成并跨越衬底中的空腔。 层系统包括在用于电路元件的基板上形成的至少一个基底层。 至少一个结构化掩模层也形成在基底层上以限定电路元件。 屏蔽层被构造在膜的区域中，使得在真空下作用在膜的区域中的机械应力被至少部分地补偿，掩蔽层的固有应力在结构化的布局中被考虑 。

公开(公告)号：US07667282B2

公开(公告)日：2010-02-23

申请号：US11187346

申请日：2005-07-21

Applicant: Joerg Muchow ,  Torsten Ohms ,  Volkmar Senz ,  Guenther-Nino-Carlo Ullrich ,  Ronald Gampp

Inventor： Joerg Muchow ,  Torsten Ohms ,  Volkmar Senz ,  Guenther-Nino-Carlo Ullrich ,  Ronald Gampp

IPC: H01L29/78

CPC classification number: B81B3/0072 ,  B81B2203/0127

Abstract: A method and a micromechanical component which counteract manufacturing-process-related mechanical stresses in the membrane are provided. The membrane is formed on a substrate in a layer system and spans a cavity in the substrate. The layer system includes at least one base layer formed on the substrate for circuit elements. At least one structured masking layer is also formed on the base layer for defining the circuit elements. The masking layer is structured in the area of the membrane in such a way that mechanical stresses acting in the area of the membrane under vacuum are at least partially compensated, the intrinsic stress of the masking layer being taken into account in the layout of the structuring.

Abstract translation: 提供了一种抵抗膜中与制造过程相关的机械应力的方法和微机械部件。 膜在层系统中的基底上形成并跨越衬底中的空腔。 层系统包括在用于电路元件的基板上形成的至少一个基底层。 至少一个结构化掩模层也形成在基底层上以限定电路元件。 屏蔽层被构造在膜的区域中，使得在真空下作用在膜的区域中的机械应力被至少部分地补偿，掩蔽层的固有应力在结构化的布局中被考虑 。