公开(公告)号：US07687783B2

公开(公告)日：2010-03-30

申请号：US12038326

申请日：2008-02-27

申请人： Elmar Platzgummer ,  Hans Löschner ,  Samuel Kvasnica ,  Reinhard Springer ,  Mathias Irmscher ,  Florian Letzkus ,  Jörg Butschke

发明人： Elmar Platzgummer ,  Hans Löschner ,  Samuel Kvasnica ,  Reinhard Springer ,  Mathias Irmscher ,  Florian Letzkus ,  Jörg Butschke

IPC分类号： H01J3/14

CPC分类号： G03F1/20 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/045 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/0437

摘要： The invention relates to a multi-beam deflector array device for use in a particle-beam exposure apparatus employing a beam of charged particles, the multi-beam deflector array device having a plate-like shape with a membrane region, the membrane region including a first side facing towards the incoming beam of particles, an array of apertures, each aperture allowing passage of a corresponding beamlet formed out of the beam of particles, a plurality of depressions, each depression being associated with at least one aperture, and an array of electrodes, each aperture being associated with at least one electrode and each electrode being located in a depression, the electrodes being configured to realize a non-deflecting state, wherein the particles that pass through the apertures are allowed to travel along a desired path, and a deflecting state, wherein the particles are deflected off the desired path.

摘要翻译： 本发明涉及一种用于使用带电粒子束的粒子束曝光装置中的多光束偏转器阵列装置，该多光束偏转器阵列装置具有带有膜区域的板状形状，该膜区域包括一个 第一面朝向输入的粒子束，一组孔，每个孔允许通过由粒子束形成的对应子束，多个凹陷，每个凹陷与至少一个孔相关联，以及阵列的 电极，每个孔与至少一个电极相关联，并且每个电极位于凹陷中，电极被配置为实现非偏转状态，其中允许通过孔的颗粒沿着期望的路径行进，并且 偏转状态，其中颗粒偏离所需的路径。

公开(公告)号：US20080203317A1

公开(公告)日：2008-08-28

申请号：US12038326

申请日：2008-02-27

申请人： Elmar Platzgummer ,  Hans Loschner ,  Samuel Kvasnica ,  Reinhard Springer ,  Mathias Irmscher ,  Florian Letzkus ,  Jorg Butschke

发明人： Elmar Platzgummer ,  Hans Loschner ,  Samuel Kvasnica ,  Reinhard Springer ,  Mathias Irmscher ,  Florian Letzkus ,  Jorg Butschke

IPC分类号： H01J3/14 ,  H01L21/20

CPC分类号： G03F1/20 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/045 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/0437

摘要： The invention relates to a multi-beam deflector array device for use in a particle-beam exposure apparatus employing a beam of charged particles, the multi-beam deflector array device having a plate-like shape with a membrane region, the membrane region including a first side facing towards the incoming beam of particles, an array of apertures, each aperture allowing passage of a corresponding beamlet formed out of the beam of particles, a plurality of depressions, each depression being associated with at least one aperture, and an array of electrodes, each aperture being associated with at least one electrode and each electrode being located in a depression, the electrodes being configured to realize a non-deflecting state, wherein the particles that pass through the apertures are allowed to travel along a desired path, and a deflecting state, wherein the particles are deflected off the desired path.

摘要翻译： 本发明涉及一种用于使用带电粒子束的粒子束曝光装置中的多光束偏转器阵列装置，该多光束偏转器阵列装置具有带有膜区域的板状形状，该膜区域包括一个 第一面朝向输入的粒子束，一组孔，每个孔允许通过由粒子束形成的对应子束，多个凹陷，每个凹陷与至少一个孔相关联，以及阵列的 电极，每个孔与至少一个电极相关联，并且每个电极位于凹陷中，电极被配置为实现非偏转状态，其中允许通过孔的颗粒沿着期望的路径行进，并且 偏转状态，其中颗粒偏离所需的路径。