公开(公告)号：US06649321B2

公开(公告)日：2003-11-18

申请号：US09885125

申请日：2001-06-21

Applicant: Ting-Kuo Tang ,  Shuo-Pin Lin ,  Cheng-Chung Hsiao ,  Yi-Chou Lin

Inventor： Ting-Kuo Tang ,  Shuo-Pin Lin ,  Cheng-Chung Hsiao ,  Yi-Chou Lin

IPC: G03C173

CPC classification number: G03F7/033 ,  C08F8/32 ,  Y10S430/106 ,  Y10S430/107 ,  Y10S430/111 ,  C08F212/08 ,  C08F222/06

Abstract: The present invention relates to a novel styrene-anhydride copolymer containing amido group, which comprises the following repeating units (I) and (II): wherein R represents a residue of (meth)acrylate monomer containing hydroxyl group; R1 and R2 are the same or different and each represents a C1-6 alkyl group, or R1 and R2 are taken together with the nitrogen atom to which they attach to form a 5- to 6-member heterocyclic group containing nitrogen. The present invention also relates to process for producing the above copolymer and to the use of the copolymer as a photo resist in an alkaline soluble development of an irradiative reaction and as a solder resistant photo resist in printed circuit boards.

Abstract translation: 本发明涉及含有酰胺基的新型苯乙烯 - 酐共聚物，其包含以下重复单元（I）和（II）：其中R表示含有羟基的（甲基）丙烯酸酯单体的残基; R 1和R 2， 2>相同或不同，各自表示C1-6烷基，或者R 1和R 2与它们所连接的氮原子一起形成含有5-6元杂环基的杂环基 氮。本发明还涉及制备上述共聚物的方法，以及在印刷电路板中作为照射反应的碱溶性显影和作为耐焊接光致抗蚀剂的共聚物作为光致抗蚀剂的用途。