公开(公告)号：US06183686B2

公开(公告)日：2001-02-06

申请号：US09365919

申请日：1999-08-03

申请人： Steven L. Bardus ,  Sohail S. Qamar ,  Anurag Bansal

发明人： Steven L. Bardus ,  Sohail S. Qamar ,  Anurag Bansal

IPC分类号： B22F314

CPC分类号： H01J37/3426 ,  B22F7/08 ,  C23C14/3414

摘要： A method of producing a sputter target assembly including a metal target attached to a metal-matrix-composite backing plate and sputter target assemblies made thereby. The method includes hot isostatically pressing a silicon carbide-aluminum powder composition to form a backing plate while simultaneously bonding the powder composition to a metal target to form a diffusion-type bond between the target and the backing plate such that the target assembly possesses extremely high resistance to warpage at high operating temperatures. A second embodiment of the sputter target assembly includes an annular sealing member of machined aluminum disposed in the backing plate around the target.

摘要翻译： 一种制造溅射靶组件的方法，该溅射靶组件包括连接到金属基复合材料背板的金属靶和由此制成的溅射靶组件。 该方法包括热等静压碳化硅 - 铝粉末组合物以形成背板，同时将粉末组合物粘合到金属靶上，以在靶和背板之间形成扩散型结合，使得目标组件具有非常高的 在高工作温度下耐翘曲。 溅射靶组件的第二实施例包括设置在围绕靶的背板中的加工铝的环形密封构件。

公开(公告)号：US5009765A

公开(公告)日：1991-04-23

申请号：US525361

申请日：1990-05-17

申请人： Sohail S. Qamar ,  Harry W. Conard ,  Lowell E. Hamilton

发明人： Sohail S. Qamar ,  Harry W. Conard ,  Lowell E. Hamilton

IPC分类号： C23C14/34 ,  H01J37/34

CPC分类号： H01J37/3435 ,  C23C14/3407 ,  C23C14/3414

摘要： A cathode sputtering assembly includes a sputter target welded to a corresponding backing member, where the target and backing member are adapted for insertion into a sputtering system. The target has a reduced diameter portion profiled for receipt within a counterbored upper section of the backing member. The target has a beveled surface above the reduced diameter section, and the backing member has an upper tapered edge, where the interface between the sputtering target and the backing member cooperate to define a V-groove. Both the target and the backing member are comprised of aluminum and the target and backing member are TIG welded together with aluminum filler rod.

摘要翻译： 阴极溅射组件包括焊接到相应的衬垫构件的溅射靶，其中靶材和背衬构件适于插入到溅射系统中。 目标具有缩小的直径部分，其形状用于接收在背衬构件的沉没的上部中。 目标在缩径部分上方具有斜面，并且背衬部件具有上锥形边缘，其中溅射靶和背衬部件之间的界面配合形成V形凹槽。 靶材和背衬材料都由铝组成，靶材和背衬材料用铝填料棒焊接在一起。