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公开(公告)号:US06911832B2
公开(公告)日:2005-06-28
申请号:US10620546
申请日:2003-07-16
IPC分类号: G01Q30/04 , G01Q40/02 , H01J37/305 , G01R31/305
CPC分类号: H01J37/3056 , H01J2237/30466
摘要: A system and method for detecting a milling endpoint on a semiconductor sample by directing an ion beam from a focused ion beam (FIB) apparatus at the sample and using charge pulse detection electronics (CPDE) components to generate a distribution curve on a histogram display. A preferred configuration of the CPDE components includes a charge preamplifier, a pulse amplifier, a pulse shaper, and a multichannel analyzer (MCA).