公开(公告)号：US20170209328A1

公开(公告)日：2017-07-27

申请号：US15514999

申请日：2015-09-28

申请人： The University of Electro-Communications ,  KIKUCHI SEISAKUSHO CO., LTD. ,  NATIONAL UNIVERSITY CORPORATION UNIVERSITY OF TOYAMA ,  TSS CO., LTD.

发明人： Hiroyuki Kajimoto ,  Michi Sato ,  Takeyoshi Iguchi ,  Takashi Asahi

IPC分类号： A61H1/00 ,  A61H11/00

CPC分类号： A61H1/006 ,  A61F5/01 ,  A61F5/02 ,  A61H11/00 ,  A61H2201/1604 ,  A61H2205/02

摘要： An orthosis 1 includes: an outer layer 2 which maintains a substantially elliptic shape; and a buffer 3 provided on the inner periphery of the outer layer 2, and buffers predetermined sites on the head. When the orthosis 1 is worn deviating from a state where the minor axis of the substantially elliptic shape corresponds to the width of the head, pressers 24a, 24b are formed which press the predetermined sites on the head with a stronger force than a force before deviation. The outer layer 2 includes adjustment portions 23a and 23b which can be close or apart in the minor axis direction of the substantially elliptic shape. The orthosis 1 further includes an adjuster 4 which adjusts the adjustment portions 23a, 23b so that the length of the minor axis of the substantially elliptic shape can correspond to the width of the head.