公开(公告)号：US20110200945A1

公开(公告)日：2011-08-18

申请号：US12738906

申请日：2009-11-12

申请人： Eiichi Uriu ,  Motohiro Taniguchi ,  Tomohiro Murakoso ,  Toshiya Otani ,  Souji Yamamoto ,  Toshiaki Fujiwara ,  Takashi Sesei ,  Noriyuki Matsubara

发明人： Eiichi Uriu ,  Motohiro Taniguchi ,  Tomohiro Murakoso ,  Toshiya Otani ,  Souji Yamamoto ,  Toshiaki Fujiwara ,  Takashi Sesei ,  Noriyuki Matsubara

IPC分类号： G03F7/20

CPC分类号： G03F7/70791 ,  G03F9/7084 ,  H01J9/241 ,  H01J11/12

摘要： An alignment mark having high precision and good visibility is formed in a simple manner without modification of a manufacturing line or a significant increase of man hours and a flat panel display is manufactured at low cost and with good productivity. To achieve this, the method includes a step of forming a photosensitive film on a substrate, a step of forming an alignment mark by exposing the photosensitive film by using an exposing mask, and a step of performing position alignment by recognizing the alignment mark in an undeveloped state of the photosensitive film.

摘要翻译： 以简单的方式形成具有高精度和良好的可视性的对准标记，而不改变生产线或显着增加工时，并且以低成本和高生产率制造平板显示器。 为了实现这一点，该方法包括在基板上形成感光膜的步骤，通过使用曝光掩模曝光感光膜来形成对准标记的步骤，以及通过在 感光膜未发展状态。