公开(公告)号：US08297292B2

公开(公告)日：2012-10-30

申请号：US12510314

申请日：2009-07-28

申请人： Takayuki Kokubo ,  Jun Yamawaku ,  Tsuyoshi Moriya

发明人： Takayuki Kokubo ,  Jun Yamawaku ,  Tsuyoshi Moriya

IPC分类号： B08B3/04

CPC分类号： B08B3/10 ,  B08B13/00 ,  B08B2230/01

摘要： Provided are a cleaning device and a cleaning method of a semiconductor manufacturing apparatus, capable of performing a cleaning process more effectively as compared to conventional cases and obtaining a high cleaning effect. A semiconductor manufacturing apparatus cleaning device 100 includes a pure water steam generating vessel 2 for generating pure water steam from pure water; a supply port 5 for supplying the pure water steam to a cleaning target portion; a supply line 4 for connecting the pure water steam generating vessel with the supply port; a collection port 6 for collecting steam used in cleaning from the cleaning target portion; a collection vessel 8 for condensing and collecting the used steam; and a collection line 7 for connecting the collection port 6 with the collection vessel 8.

摘要翻译： 提供了一种半导体制造装置的清洁装置和清洁方法，与常规情况相比，能够更有效地进行清洁处理并获得高清洁效果。 半导体制造装置清洁装置100包括用于从纯水产生纯水蒸汽的纯水蒸汽发生容器2， 用于将纯水蒸汽供应到清洁目标部分的供应口5; 用于将纯水蒸汽发生容器与供给口连接的供应管线4; 用于从清洁目标部分收集用于清洁的蒸汽的收集口6; 用于冷凝和收集用过的蒸汽的收集容器8; 以及用于将收集口6与收集容器8连接的收集线7。

公开(公告)号：US20100018552A1

公开(公告)日：2010-01-28

申请号：US12510314

申请日：2009-07-28

申请人： Takayuki Kokubo ,  Jun Yamawaku ,  Tsuyoshi Moriya

发明人： Takayuki Kokubo ,  Jun Yamawaku ,  Tsuyoshi Moriya

IPC分类号： B08B3/10 ,  B08B13/00

CPC分类号： B08B3/10 ,  B08B13/00 ,  B08B2230/01

摘要： Provided are a cleaning device and a cleaning method of a semiconductor manufacturing apparatus, capable of performing a cleaning process more effectively as compared to conventional cases and obtaining a high cleaning effect. A semiconductor manufacturing apparatus cleaning device 100 includes a pure water steam generating vessel 2 for generating pure water steam from pure water; a supply port 5 for supplying the pure water steam to a cleaning target portion; a supply line 4 for connecting the pure water steam generating vessel with the supply port; a collection port 6 for collecting steam used in cleaning from the cleaning target portion; a collection vessel 8 for condensing and collecting the used steam; and a collection line 7 for connecting the collection port 6 with the collection vessel 8.

摘要翻译： 提供了一种半导体制造装置的清洁装置和清洁方法，与常规情况相比，能够更有效地进行清洁处理并获得高清洁效果。 半导体制造装置清洁装置100包括用于从纯水产生纯水蒸汽的纯水蒸汽发生容器2， 用于将纯水蒸汽供应到清洁目标部分的供应口5; 用于将纯水蒸汽发生容器与供给口连接的供应管线4; 用于从清洁目标部分收集用于清洁的蒸汽的收集口6; 用于冷凝和收集用过的蒸汽的收集容器8; 以及用于将收集口6与收集容器8连接的收集线7。