公开(公告)号：US5539521A

公开(公告)日：1996-07-23

申请号：US524464

申请日：1995-09-07

申请人： Taro Otokake ,  Takashi Endo ,  Hisao Izawa ,  Kazuhiro Takaoka

发明人： Taro Otokake ,  Takashi Endo ,  Hisao Izawa ,  Kazuhiro Takaoka

IPC分类号： G01B11/30 ,  G03F7/20

CPC分类号： G03F7/70691 ,  G01B11/306

摘要： A pattern position measuring method of measuring two-dimensional positions of a hyperfine pattern formed on the surface of a substrate. This method comprises a pattern position measuring step of measuring the positions of the pattern in a first flexural configuration produced in a supported state where the measured substrate is supported in a first plurality of positions of the measured substrate on a stage, a flexural configuration detecting step of detecting the first flexural configuration of the surface of the measured substrate, and a correcting step of correcting the pattern positions in the first flexural configuration that are measured by the pattern position measuring step to pattern positions in a second flexural configuration on the basis of the pattern positions in the first flexural configuration that are measured by the pattern position measuring step, the first flexural configuration detected by the flexural configuration detecting step and the previously stored second flexural configuration of the surface of the measured substrate which is produced when the measured substrate is supported in a second plurality of positions different from the first plurality of positions.

摘要翻译： 测量形成在基板表面上的超精细图案的二维位置的图案位置测量方法。 该方法包括图案位置测量步骤，该图案位置测量步骤测量在支撑状态下产生的第一弯曲构造中的图案的位置，其中所测量的基板被支撑在被测基板的台的第一多个位置中，弯曲构造检测步骤 检测所测量的基板的表面的第一弯曲构造;以及校正步骤，用于校正通过图案位置测量步骤测量的第一弯曲构造中的图案位置，以基于第二弯曲构造来对第二弯曲构造中的图案位置进行 通过图案位置测量步骤测量的第一弯曲构造中的图案位置，由弯曲构造检测步骤检测到的第一弯曲构造以及当测量的衬底是所测量的衬底时所测量的衬底的表面的先前存储的第二弯曲构造 支持在第二个pl 不同于第一组多个职位的职位。