公开(公告)号：US08069974B2

公开(公告)日：2011-12-06

申请号：US12169966

申请日：2008-07-09

申请人： Reinhardt Bauer ,  Johannes Struempfel ,  Andreas Heisig ,  Matthias Smolke ,  Thomas Posseckardt ,  Frank Hupka

发明人： Reinhardt Bauer ,  Johannes Struempfel ,  Andreas Heisig ,  Matthias Smolke ,  Thomas Posseckardt ,  Frank Hupka

IPC分类号： B65G43/00

CPC分类号： B65G43/04

摘要： In a transport device, which comprises at least one endless conveyor guided around at least two guide rollers, a monitoring appliance for monitoring motion of a guide roller is positioned on at least one of the guide rollers. The monitoring appliance comprises a first contact element disposed on and electrically connected with the guide roller, and a second contact element disposed near the guide roller. The first and second contact elements are arranged relative to one another in such a way that an electrical contact between them occurs with every revolution of the guide roller, such that the electric potential of the guide roller is transmitted to the second contact element. Additionally, a substrate treatment apparatus comprising such transport device is disclosed.

摘要翻译： 在包括围绕至少两个引导辊引导的至少一个环形输送机的输送装置中，用于监测导辊运动的监控装置被定位在至少一个导辊上。 监控装置包括设置在引导辊上并与导向辊电连接的第一接触元件和设置在引导辊附近的第二接触元件。 第一和第二接触元件相对于彼此布置，使得它们之间的电接触发生在导辊的每转一圈，使得导向辊的电位传递到第二接触元件。 另外，公开了一种包括该输送装置的基板处理装置。

公开(公告)号：US20090014285A1

公开(公告)日：2009-01-15

申请号：US12169966

申请日：2008-07-09

申请人： Reinhardt BAUER ,  Johannes Struempfel ,  Andreas Heisig ,  Matthias Smolke ,  Thomas Posseckardt ,  Frank Hupka

发明人： Reinhardt BAUER ,  Johannes Struempfel ,  Andreas Heisig ,  Matthias Smolke ,  Thomas Posseckardt ,  Frank Hupka

IPC分类号： B65G43/02

CPC分类号： B65G43/04

摘要： In a transport device, which comprises at least one endless conveyor guided around at least two guide rollers, a monitoring appliance for monitoring motion of a guide roller is positioned on at least one of the guide rollers. The monitoring appliance comprises a first contact element disposed on and electrically connected with the guide roller, and a second contact element disposed near the guide roller. The first and second contact elements are arranged relative to one another in such a way that an electrical contact between them occurs with every revolution of the guide roller, such that the electric potential of the guide roller is transmitted to the second contact element. Additionally, a substrate treatment apparatus comprising such transport device is disclosed.

摘要翻译： 在包括围绕至少两个引导辊引导的至少一个环形输送机的输送装置中，用于监测导辊运动的监控装置被定位在至少一个导辊上。 监控装置包括设置在引导辊上并与导向辊电连接的第一接触元件和设置在引导辊附近的第二接触元件。 第一和第二接触元件相对于彼此布置，使得它们之间的电接触发生在导辊的每转一圈，使得导向辊的电位传递到第二接触元件。 另外，公开了一种包括该输送装置的基板处理装置。