专利检索 ap:"TimeDomain CVD, Inc." 第 1 页

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发明申请
Atmospheric pressure inductive plasma apparatus 失效

公开(公告)号：US20010008229A1

公开(公告)日：2001-07-19

申请号：US09768979

申请日：2001-01-23

申请人： TimeDomain CVD, Inc.

发明人： Simon I. Selitser

IPC分类号： B23K010/00

CPC分类号： B23K10/003

摘要： An inductive plasma torch operating at atmospheric pressure is used for wafer or glass substrate processing. Said torch employs a linear type of plasma confinement. This linear torch is particularly suitable for photoresist etching and processes in which it has the advantages of high chemical isotropic etch rate and low plasma damage.