摘要:
A light adjusting apparatus includes a substrate (10, 40) having an aperture, a plurality of incident light adjusting units (20a, 20b, 20c) each moving in a same plane, and a plurality of driving units (50a, 50b, 50c) respectively driving the incident light adjusting units (20a, 20b, 20c), and adjusts an incident light passing through the aperture by mutually moving the incident light adjusting units (20a, 20b, 20c) with the driving units to an aperture position that is center-aligned with the aperture and a retracted position that is retracted from the aperture. An incident light adjusting unit that is moved to the aperture position is positioned by contacting with at least one of other incident light adjusting units that are retracted from the aperture.
摘要:
A light adjusting apparatus includes a substrate (10, 40) having an aperture, a plurality of incident light adjusting units (20a, 20b, 20c) each moving in a same plane, and a plurality of driving units (50a, 50b, 50c) respectively driving the incident light adjusting units (20a, 20b, 20c), and adjusts an incident light passing through the aperture by mutually moving the incident light adjusting units (20a, 20b, 20c) with the driving units to an aperture position that is center-aligned with the aperture and a retracted position that is retracted from the aperture. An incident light adjusting unit that is moved to the aperture position is positioned by contacting with at least one of other incident light adjusting units that are retracted from the aperture.