Process for coating a substrate
    1.
    发明申请
    Process for coating a substrate 审中-公开
    涂覆基材的方法

    公开(公告)号:US20050153146A1

    公开(公告)日:2005-07-14

    申请号:US11000862

    申请日:2004-12-01

    CPC分类号: B05D7/536 B05D3/148 B05D7/02

    摘要: The invention describes a process for coating a substrate with at least two layers, characterized by the following steps: a) applying a first layer comprising a first inorganic component to a substrate or to one of at least one layer applied to a substrate; b) treating the first layer with a plasma; c) applying a second layer comprising a second inorganic component to the first layer treated with plasma in accordance with b).

    摘要翻译: 本发明描述了一种用至少两层涂覆基材的方法,其特征在于以下步骤:a)将包含第一无机组分的第一层施加至基材或施加至基材的至少一层中的至少一层; b)用等离子体处理第一层; c)根据b)将包含第二无机组分的第二层施加到用等离子体处理的第一层中。