公开(公告)号：US20050266335A1

公开(公告)日：2005-12-01

申请号：US10945334

申请日：2004-09-20

申请人： Donald Johnson ,  William Weber ,  Pamela Waterson ,  Vincent Urdi ,  Joseph Molea ,  Thomas Strand

发明人： Donald Johnson ,  William Weber ,  Pamela Waterson ,  Vincent Urdi ,  Joseph Molea ,  Thomas Strand

IPC分类号： G03F7/00 ,  G03F7/004 ,  G03F7/038 ,  G03F7/16

CPC分类号： G03F7/0385 ,  G03F7/038 ,  G03F7/161

摘要： A photoimagable composition suitable for use as a negative photoresist comprising: (A) at least one epoxidized polyfunctional bisphenol A formaldehyde novolak resin; (B) at least one polycaprolactone polyol reactive diluent, wherein the amount of component (A) is from about 95% to about 75% by weight of the sum of (A) and (B) and the amount of component (B) is from about 5% to about 25% by weight of the sum of (A) and (B); (C) at least one photoacid generator in an amount from about 2.5 to about 12.5 parts per hundred parts of resin and reactive diluent, which initiates polymerization upon exposure to actinic radiation; and (D) a sufficient amount of solvent to dissolve (A), (B) and (C); wherein the solvent comprises 2-pentanone, 3-pentanone, and 1,3-dioxolane and mixtures thereof.

摘要翻译： 适合用作负性光致抗蚀剂的可光成像组合物，其包含：（A）至少一种环氧化多官能双酚A甲醛酚醛清漆树脂; （B）至少一种聚己内酯多元醇反应性稀释剂，其中组分（A）的量为（A）和（B）之和的总量的约95重量％至约75重量％，组分（B）的量为 （A）和（B）之和的约5％至约25％; （C）至少一种光致酸产生剂，其量为每百份树脂和反应性稀释剂约2.5至约12.5份，其在暴露于光化辐射时引发聚合; 和（D）足够量的溶剂以溶解（A），（B）和（C）; 其中溶剂包括2-戊酮，3-戊酮和1,3-二氧戊环及其混合物。