公开(公告)号：US4722286A

公开(公告)日：1988-02-02

申请号：US900438

申请日：1986-08-26

Applicant: Walter R. Portner

Inventor： Walter R. Portner

IPC: A21B1/24 ,  A21B3/04 ,  C21D9/00 ,  F27B17/00 ,  F27D7/06 ,  F23G5/12

CPC classification number: C21D9/0037 ,  A21B1/24 ,  A21B3/04 ,  F27B17/0083 ,  F27D7/06

Abstract: An oven is described which is especially adapted to maintain accurate and uniform temperature control. The device of the invention includes a central treatment chamber surrounded by a plenum chamber which, through a number of spaced apart apertures introduces gases at a preselected temperature and elevated pressure into the treatment chamber. The plenum chamber is configured to insure a substantially uniform pressure at each of the apertures to provide a uniform flow of temperature regulated gases through each of the apertures.

Abstract translation: 描述了一种特别适用于保持精确和均匀的温度控制的烘箱。 本发明的装置包括一个中央处理室，该中央处理室被一个通风室围绕，通风室通过多个间隔开的孔以预先选定的温度和升高的压力将气体引入处理室。 增压室被构造成确保每个孔处的基本上均匀的压力，以通过每个孔提供均匀的温度调节气体流。