公开(公告)号：US08657889B2

公开(公告)日：2014-02-25

申请号：US13262776

申请日：2010-03-29

申请人： Johannes Krijne ,  Erwin Eiling ,  Karl-Heinz Hohaus ,  Wolfgang Goergen ,  Andreas Lovich ,  Marc Philippens ,  Richard Scheicher ,  Ansgar Fischer ,  Martin Mueller

发明人： Johannes Krijne ,  Erwin Eiling ,  Karl-Heinz Hohaus ,  Wolfgang Goergen ,  Andreas Lovich ,  Marc Philippens ,  Richard Scheicher ,  Ansgar Fischer ,  Martin Mueller

IPC分类号： H01L51/40

摘要： An arrangement (1) for holding a substrate (10) in a material deposition apparatus, which substrate (10) has a deposition side (10a) upon which material (M) is to be deposited, and which arrangement (1) comprises: a shadow mask (20) comprising a number of deposition openings (Di); a support structure (30) comprising a number of surround openings (Si); and a support structure holding means (6) for holding the support mask (30) and/or a substrate holding means (5) for holding the substrate (10), such that the support structure (30) is on the same side as the deposition side (10a) of the substrate (10), and the shadow mask (20) is positioned between the substrate (10) and the support structure (30) such that at least one deposition opening (Di) of the shadow mask (10) lies within a corresponding surround opening (Si) of the support structure (30).

公开(公告)号：US20120178190A1

公开(公告)日：2012-07-12

申请号：US13262776

申请日：2010-03-29

申请人： Johannes Krijne ,  Erwin Eiling ,  Karl-Heinz Hohaus ,  Wolfgang Goergen ,  Andreas Lovich ,  Marc Philippens ,  Richard Scheicher ,  Ansgar Fischer ,  Martin Mueller

发明人： Johannes Krijne ,  Erwin Eiling ,  Karl-Heinz Hohaus ,  Wolfgang Goergen ,  Andreas Lovich ,  Marc Philippens ,  Richard Scheicher ,  Ansgar Fischer ,  Martin Mueller

IPC分类号： H01L51/56 ,  B05D3/12 ,  B05C13/02

CPC分类号： C23C14/042 ,  C23C14/50

摘要： An arrangement (1) for holding a substrate (10) in a material deposition apparatus, which substrate (10) has a deposition side (10a) upon which material (M) is to be deposited, and which arrangement (1) comprises: a shadow mask (20) comprising a number of deposition openings (Di); a support structure (30) comprising a number of surround openings (Si); and a support structure holding means (6) for holding the support mask (30) and/or a substrate holding means (5) for holding the substrate (10), such that the support structure (30) is on the same side as the deposition side (10a) of the substrate (10), and the shadow mask (20) is positioned between the substrate (10) and the support structure (30) such that at least one deposition opening (Di) of the shadow mask (10) lies within a corresponding surround opening (Si) of the support structure (30).

摘要翻译： 一种用于将材料（10）保持在材料沉积装置中的装置（1），所述衬底（10）具有要沉积材料（M）的沉积侧（10a），并且所述装置（1）包括： 包括多个沉积开口（Di）的荫罩（20）; 包括多个环绕开口（Si）的支撑结构（30）; 以及用于保持支撑掩模（30）的支撑结构保持装置（6）和/或用于保持基板（10）的基板保持装置（5），使得支撑结构（30）位于与 所述基板（10）的沉积侧（10a）和所述荫罩（20）位于所述基板（10）和所述支撑结构（30）之间，使得所述荫罩（10）的至少一个沉积开口（Di） ）位于支撑结构（30）的相应环绕开口（Si）内。

公开(公告)号：US08808402B2

公开(公告)日：2014-08-19

申请号：US13262776

申请日：2010-03-29

申请人： Johannes Krijne ,  Erwin Eiling ,  Karl-Heinz Hohaus ,  Wolfgang Goergen ,  Andreas Lovich ,  Marc Philippens ,  Richard Scheicher ,  Ansgar Fischer ,  Martin Mueller

发明人： Johannes Krijne ,  Erwin Eiling ,  Karl-Heinz Hohaus ,  Wolfgang Goergen ,  Andreas Lovich ,  Marc Philippens ,  Richard Scheicher ,  Ansgar Fischer ,  Martin Mueller

IPC分类号： H01L51/40

CPC分类号： C23C14/042 ,  C23C14/50

摘要： An arrangement (1) for holding a substrate (10) in a material deposition apparatus, which substrate (10) has a deposition side (10a) upon which material (M) is to be deposited, and which arrangement (1) comprises: a shadow mask (20) comprising a number of deposition openings (Di); a support structure (30) comprising a number of surround openings (Si); and a support structure holding means (6) for holding the support mask (30) and/or a substrate holding means (5) for holding the substrate (10), such that the support structure (30) is on the same side as the deposition side (10a) of the substrate (10), and the shadow mask (20) is positioned between the substrate (10) and the support structure (30) such that at least one deposition opening (Di) of the shadow mask (10) lies within a corresponding surround opening (Si) of the support structure (30).

摘要翻译： 一种用于将材料（10）保持在材料沉积装置中的装置（1），所述衬底（10）具有要沉积材料（M）的沉积侧（10a），并且所述装置（1）包括： 包括多个沉积开口（Di）的荫罩（20）; 包括多个环绕开口（Si）的支撑结构（30）; 以及用于保持支撑掩模（30）的支撑结构保持装置（6）和/或用于保持基板（10）的基板保持装置（5），使得支撑结构（30）位于与 所述基板（10）的沉积侧（10a）和所述荫罩（20）位于所述基板（10）和所述支撑结构（30）之间，使得所述荫罩（10）的至少一个沉积开口（Di） ）位于支撑结构（30）的相应环绕开口（Si）内。