公开(公告)号：US08436969B2

公开(公告)日：2013-05-07

申请号：US13031230

申请日：2011-02-20

Applicant: Yao-Jen Ou ,  Hang-Lian Lee ,  Jian-Cheng Chen ,  Bo-Chin Tsuei

Inventor： Yao-Jen Ou ,  Hang-Lian Lee ,  Jian-Cheng Chen ,  Bo-Chin Tsuei

IPC: G02F1/1337

CPC classification number: G02F1/133788

Abstract: A photo alignment process and a liquid crystal display using the same are provided. The photo alignment process includes the following steps. A photo alignment material layer is formed on a substrate. The photo alignment material layer is irradiated by a linearly polarized light. A surface of the photo alignment material layer is a first plane. A wave vector of the linearly polarized light is a K vector. A second plane is constructed from a normal vector of the first plane and the K vector. A polarization direction of the linearly polarized light is neither perpendicular nor parallel to the second plane.

Abstract translation: 提供光取向处理和使用其的液晶显示器。 照片对准过程包括以下步骤。 在基板上形成光取向材料层。 光线取向材料层被线偏振光照射。 光取向材料层的表面是第一平面。 线偏振光的波矢是K矢量。 第二平面由第一平面和K向量的法向量构成。 线偏振光的偏振方向既不垂直也不平行于第二平面。

公开(公告)号：US20120086893A1

公开(公告)日：2012-04-12

申请号：US13031230

申请日：2011-02-20

Applicant: Yao-Jen OU ,  Hang-Lian LEE ,  Jian-Cheng CHEN ,  Bo-Chin TSUEI

Inventor： Yao-Jen OU ,  Hang-Lian LEE ,  Jian-Cheng CHEN ,  Bo-Chin TSUEI

IPC: G02F1/1337 ,  B29C67/00 ,  G02F1/1335

CPC classification number: G02F1/133788

Abstract: A photo alignment process and a liquid crystal display using the same are provided. The photo alignment process includes the following steps. A photo alignment material layer is formed on a substrate. The photo alignment material layer is irradiated by a linearly polarized light. A surface of the photo alignment material layer is a first plane. A wave vector of the linearly polarized light is a K vector. A second plane is constructed from a normal vector of the first plane and the K vector. A polarization direction of the linearly polarized light is neither perpendicular nor parallel to the second plane.

Abstract translation: 提供光取向处理和使用其的液晶显示器。 照片对准过程包括以下步骤。 在基片上形成光取向材料层。 光线取向材料层被线偏振光照射。 光取向材料层的表面是第一平面。 线偏振光的波矢是K矢量。 第二平面由第一平面和K向量的法向量构成。 线偏振光的偏振方向既不垂直也不平行于第二平面。