Wet-processing apparatus
    1.
    发明授权
    Wet-processing apparatus 有权
    湿处理设备

    公开(公告)号:US08356951B2

    公开(公告)日:2013-01-22

    申请号:US13105040

    申请日:2011-05-11

    IPC分类号: G03D5/00

    CPC分类号: H01L21/67253 H01L21/6715

    摘要: A wet-processing apparatus, which spouts a coating liquid onto a surface of a substrate, includes: nozzles provided with passages for the coating liquid; a light source which illuminates an area between a plane containing the tips of the nozzles and the surface of the substrate; a camera for forming an image of the area; a control unit which provides a spout signal requesting spouting the liquid from the nozzle toward the substrate, and an imaging signal requesting the camera to start an imaging operation; and a decision unit which decides whether or not the liquid was spouted from the nozzle and whether or not changes occurred in the condition of the liquid spouted from the nozzle toward the substrate on the basis of an image formed by the camera and expressing the brightness of the liquid spouted toward the substrate and illuminated by light emitted by the light source.

    摘要翻译: 将涂布液喷射到基板的表面上的湿式处理装置包括:设置有用于涂布液体的通道的喷嘴; 照明包含喷嘴的顶端的平面与基板的表面之间的区域的光源; 用于形成该区域的图像的相机; 控制单元,其提供用于从喷嘴朝向基板喷射液体的喷口信号,以及请求相机开始成像操作的成像信号; 以及决定单元,其基于由所述照相机形成的图像,判定从所述喷嘴喷出的液体是否被喷出,以及在从所述喷嘴朝向所述基板喷射的液体的状态下是否发生变化, 液体朝向基板喷射并被光源发出的光照射。

    WET-PROCESSING APPARATUS
    2.
    发明申请
    WET-PROCESSING APPARATUS 有权
    湿处理设备

    公开(公告)号:US20110286738A1

    公开(公告)日:2011-11-24

    申请号:US13105040

    申请日:2011-05-11

    IPC分类号: G03D5/00

    CPC分类号: H01L21/67253 H01L21/6715

    摘要: A wet-processing apparatus, which spouts a coating liquid onto a surface of a substrate of a substrate, includes: nozzles provided with passages for the coating liquid; a light source which illuminates an area between a plane containing the tips of the nozzles and the surface of the substrate; a camera for forming an image of the area; a control unit which provides a spout signal requesting spouting the liquid from the nozzle toward the substrate, and an imaging signal requesting the camera to start an imaging operation; and a decision unit which decides whether or not the liquid was spouted from the nozzle and whether or not changes occurred in the condition of the liquid spouted from the nozzle toward the substrate on the basis of an image formed by the camera and expressing the brightness of the liquid spouted toward the substrate and illuminated by light emitted by the light source.

    摘要翻译: 将涂布液喷射到基板的基板的表面上的湿式处理装置包括:设置有涂布液通道的喷嘴; 照明包含喷嘴的顶端的平面与基板的表面之间的区域的光源; 用于形成该区域的图像的相机; 控制单元,其提供用于从喷嘴朝向基板喷射液体的喷口信号,以及请求相机开始成像操作的成像信号; 以及决定单元,其基于由所述照相机形成的图像,判定从所述喷嘴喷出的液体是否被喷出,以及在从所述喷嘴朝向所述基板喷射的液体的状态下是否发生变化, 液体朝向基板喷射并被光源发出的光照射。