Method and apparatus for detecting defects in wafers
    1.
    发明授权
    Method and apparatus for detecting defects in wafers 有权
    用于检测晶片缺陷的方法和装置

    公开(公告)号:US07813541B2

    公开(公告)日:2010-10-12

    申请号:US11069712

    申请日:2005-02-28

    IPC分类号: G06K9/00

    摘要: A method for inspecting a wafer including a multiplicity of dies, the method including dividing an image of at least a portion of the wafer into a plurality of sub-images each representing a sub-portion of the wafer and selecting at least one defect candidate within each sub-image by comparing each sub-image to a corresponding sub-image of a reference including a representation, which is assumed to be faultless, of the portion of the wafer.

    摘要翻译: 一种用于检查包括多个管芯的晶片的方法,所述方法包括将晶片的至少一部分的图像划分成多个子图像,每个子图像表示晶片的子部分,并且选择至少一个缺陷候选物 每个子图像通过将每个子图像与包括晶片的该部分的被认为是无故障的表示的参考的对应子图像进行比较。

    Method and apparatus for detecting defects in wafers
    2.
    发明申请
    Method and apparatus for detecting defects in wafers 有权
    用于检测晶片缺陷的方法和装置

    公开(公告)号:US20060193507A1

    公开(公告)日:2006-08-31

    申请号:US11069712

    申请日:2005-02-28

    IPC分类号: G06K9/00

    摘要: A method for inspecting a wafer including a multiplicity of dies, the method including dividing an image of at least a portion of the wafer into a plurality of sub-images each representing a sub-portion of the wafer and selecting at least one defect candidate within each sub-image by comparing each sub-image to a corresponding sub-image of a reference including a representation, which is assumed to be faultless, of the portion of the wafer.

    摘要翻译: 一种用于检查包括多个管芯的晶片的方法,所述方法包括将晶片的至少一部分的图像划分成多个子图像,每个子图像表示晶片的子部分,并且选择至少一个缺陷候选物 每个子图像通过将每个子图像与包括晶片的该部分的被认为是无故障的表示的参考的对应子图像进行比较。