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公开(公告)号:US5432149A
公开(公告)日:1995-07-11
申请号:US225076
申请日:1994-04-08
IPC分类号: H01L39/24
CPC分类号: H01L39/2496 , Y10S505/701 , Y10S505/702
摘要: A weak link is patterned from a high-temperature superconducting film using standard lithographic techniques. Once the area in which the weak link is to be located is defined, the remainder of the film is covered with an oxygen-impermeable material. The oxygen is then removed in the weak link area by placing the sample in a vacuum furnace at a sufficient temperature to drive out the oxygen. Once the oxygen is removed, the weak link becomes non-superconducting. A high power solid state laser is placed in front of the weak link, and superconductivity is restored in the weak link area, in situ. The process is performed in a liquid nitrogen environment.
摘要翻译: 使用标准光刻技术从高温超导膜图案化弱连接。 一旦定义了薄弱环节的区域,薄膜的其余部分被不透氧材料覆盖。 然后通过将样品置于真空炉中足够的温度以排出氧气,在弱连接区域中除去氧气。 一旦除氧,弱连接就变成非超导体。 高功率固体激光器放置在弱连接器的前面,原位在弱连接区域恢复超导性。 该过程在液氮环境中进行。