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公开(公告)号:US10545233B1
公开(公告)日:2020-01-28
申请号:US16559005
申请日:2019-09-03
申请人: 3D at Depth, Inc.
摘要: Described herein are methods and devices for improved location of any and all underwater structures or equipment installed underwater. In particular, systems are disclosed that combine optical and acoustic metrology for locating objects in underwater environments. The systems allow for relative positions of objects to be determined with great accuracy using optical techniques, and support enhanced location of devices that utilize acoustic location techniques. In addition, location information can be provided by the system even in conditions that make optical metrology techniques impossible or impractical.
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公开(公告)号:US20200011992A1
公开(公告)日:2020-01-09
申请号:US16559005
申请日:2019-09-03
申请人: 3D at Depth, Inc.
摘要: Described herein are methods and devices for improved location of any and all underwater structures or equipment installed underwater. In particular, systems are disclosed that combine optical and acoustic metrology for locating objects in underwater environments. The systems allow for relative positions of objects to be determined with great accuracy using optical techniques, and support enhanced location of devices that utilize acoustic location techniques. In addition, location information can be provided by the system even in conditions that make optical metrology techniques impossible or impractical.
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公开(公告)号:US20190011552A1
公开(公告)日:2019-01-10
申请号:US16031867
申请日:2018-07-10
申请人: 3D at Depth, Inc.
摘要: Described herein are methods and devices for improved location of any and all underwater structures or equipment installed underwater. In particular, systems are disclosed that combine optical and acoustic metrology for locating objects in underwater environments. The systems allow for relative positions of objects to be determined with great accuracy using optical techniques, and support enhanced location of devices that utilize acoustic location techniques. In addition, location information can be provided by the system even in conditions that make optical metrology techniques impossible or impractical.
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