公开(公告)号：US20250033162A1

公开(公告)日：2025-01-30

申请号：US18717617

申请日：2022-12-28

Applicant: 3M INNOVATIVE PROPERTIES COMPANY

Inventor： Qin Lin ,  Alexander W. Simpson ,  Duy K. Lehuu ,  David J. Muradian ,  Matthew J. Triemert ,  Craig R. Hoff

IPC: B24B37/26

Abstract: Polishing pads include a polishing layer having a thickness and including a polymer having a working surface and a second surface opposite the working surface are described. In particular, polishing pads where the working surface includes a window, a plurality of precisely shaped pored, a plurality of precisely shaped asperities, and a land region are described. The window has a thickness different from the thickness of the polishing layer and includes a fluorinated polymer. The window has at least 20% transmission for any wavelength of light between 200 nm and 800 nm.