公开(公告)号：US20250093552A1

公开(公告)日：2025-03-20

申请号：US18962964

申请日：2024-11-27

Applicant: AGC Inc.

Inventor： Yasuhisa NISHIKAWA ,  Kazuya Takemoto ,  Hideaki Takahoshi ,  Tamotsu Morimoto

IPC: G02B1/118 ,  G02B1/115 ,  G02B1/18

Abstract: An antiglare layer-attached transparent substrate includes: a transparent substrate comprising two main surfaces; and an antiglare layer and an anti-reflective layer in this order on at least one main surface of the transparent substrate. The antiglare layer-attached transparent substrate has a haze value of 30% or more, and a skewness Ssk of 0.4 or less on a surface having the antiglare layer, and the antiglare layer contains fine particles, and a difference between a thickness of the antiglare layer and an average particle diameter of the fine particles is 4 μm or less.

公开(公告)号：US20220315483A1

公开(公告)日：2022-10-06

申请号：US17841726

申请日：2022-06-16

Applicant: AGC Inc.

Inventor： Yasuhisa NISHIKAWA ,  Daisuke KOBAYASHI

IPC: C03C17/34

Abstract: A transparent substrate provided with a multilayer film includes: a transparent substrate having two main surfaces; and a multilayer film obtained by laminating a metal oxide layer and a silicon oxide layer in order on at least one of the main surfaces of the transparent substrate. SiOx in at least one silicon oxide layer in the multilayer film satisfies a relationship 1.55≤x

公开(公告)号：US20250028083A1

公开(公告)日：2025-01-23

申请号：US18908069

申请日：2024-10-07

Applicant: AGC Inc.

Inventor： Hideaki TAKAHOSHI ,  Yasuhisa NISHIKAWA

IPC: G02B1/115 ,  C03C17/34 ,  C03C17/42 ,  C08J7/06 ,  G02B1/18 ,  G02F1/1333 ,  G09F9/30

Abstract: An anti-reflective film-attached transparent substrate includes a transparent substrate and an anti-reflective film. The anti-reflective film has a laminated structure in which at least two layers having different refractive indices are laminated, at least one layer is mainly formed of a Si oxide, at least another layer is a mixed oxide layer mainly formed of a mixed oxide containing Mo and Nb, the mixed oxide layer contains an oxide of at least one high hardness metal element selected from the group consisting of W, Cr, Mn, Ni, Zr, Ta, and Be, a proportion of Mo to a total of Mo and Nb in the mixed oxide layer is 60 at % or less, and a proportion of a total of the high hardness metal element to a total of metal elements in the mixed oxide layer is 12 at % or more.