公开(公告)号：US20190078210A1

公开(公告)日：2019-03-14

申请号：US15702234

申请日：2017-09-12

Applicant: APPLIED MATERIALS, INC.

Inventor： FARUK GUNGOR ,  DIEN-YEH WU ,  JOEL M. HUSTON ,  MEI CHANG ,  XIAOXIONG YUAN ,  KAZUYA DAITO ,  AVGERINOS V. GELATOS ,  TAKASHI KURATOMI ,  YU CHANG ,  BIN CAO

IPC: C23C16/455 ,  C23C16/46 ,  C23C16/458 ,  C23C16/505

Abstract: Apparatus for processing a substrate are provided herein. In some embodiments a showerhead assembly includes a gas distribution plate having a plurality of apertures; a holder having a wall, an radially inwardly extending flange extending from a lower portion of the wall and coupled to the gas distribution plate, and a radially outwardly extending flange extending from an upper portion of the wall, wherein the wall has a thickness between about 0.015 inches and about 0.2 inches; and a heating apparatus disposed above and spaced apart from the gas distribution plate, wherein the heating apparatus includes a heater configured to heat the gas distribution plate.