公开(公告)号：US20200286717A1

公开(公告)日：2020-09-10

申请号：US16406921

申请日：2019-05-08

Applicant: APPLIED MATERIALS, INC.

Inventor： JAEYONG CHO ,  SHAHID RAUF ,  PENG TIAN

IPC: H01J37/32 ,  H01L21/683

Abstract: Embodiments of an electrostatic chuck are provided herein. In some embodiments, an electrostatic chuck for use in a substrate processing chamber includes a plate having a first side and a second side opposite the first side, a first electrode embedded in the plate proximate the first side, a second electrode embedded in the plate proximate the second side, a plurality of conductive elements coupling the first electrode to the second electrode, a first gas channel disposed within the plate and between the first electrode and the second electrode, a gas inlet extending from the second side of the plate to the first gas channel; and a plurality of gas outlets extending from the first side of the plate to the first gas channel.