公开(公告)号：US20200300618A1

公开(公告)日：2020-09-24

申请号：US16711005

申请日：2019-12-11

Applicant: APPLIED MATERIALS, INC.

Inventor： REGINA FREED ,  RUSSELL CHIN YEE TEO ,  MADHUR SACHAN

IPC: G01B15/00 ,  H01J37/28

Abstract: Methods and apparatus for inspecting features on a substrate including exposing at least a portion of the substrate to a first electron beam landing energy to obtain a first image; exposing the at least a portion of the substrate to a second electron beam landing energy to obtain a second image, wherein the second electron beam landing energy is different from the first electron beam landing energy; realigning the first image and the second image to a feature on the substrate; and determining from at least one measurement from the first image associated with the feature and at least one measurement from the second image associated with the feature if the feature is leaning or twisting.