公开(公告)号：US20210384011A1

公开(公告)日：2021-12-09

申请号：US16894002

申请日：2020-06-05

Applicant: APPLIED MATERIALS, INC.

Inventor： Tae Seung CHO ,  Saravana Kumar NATARAJAN ,  Kenneth D. SCHATZ ,  Dmitry LUBOMIRSKY ,  Samartha SUBRAMANYA

IPC: H01J37/32 ,  H05H1/46

Abstract: Methods and apparatus for reducing particle generation in a remote plasma source (RPS) include an RPS having a first plasma source with a first electrode and a second electrode, wherein the first electrode and the second electrode are symmetrical with hollow cavities configured to induce a hollow cathode effect within the hollow cavities, and wherein the RPS provides radicals or ions into the processing volume, and a radio frequency (RF) power source configured to provide a symmetrical driving waveform on the first electrode and the second electrode to produce an anodic cycle and a cathodic cycle of the RPS, wherein the anodic cycle and the cathodic cycle operate in a hollow cathode effect mode.

公开(公告)号：US20220293396A1

公开(公告)日：2022-09-15

申请号：US17824977

申请日：2022-05-26

Applicant: APPLIED MATERIALS, INC.

Inventor： Tae Seung CHO ,  Saravana Kumar NATARAJAN ,  Kenneth D. SCHATZ ,  Dmitry LUBOMIRSKY ,  Samartha SUBRAMANYA

IPC: H01J37/32 ,  H05H1/46

Abstract: Methods and apparatus for reducing particle generation in a remote plasma source (RPS) include an RPS having a first plasma source with a first electrode and a second electrode, wherein the first electrode and the second electrode are symmetrical with hollow cavities configured to induce a hollow cathode effect within the hollow cavities, and wherein the RPS provides radicals or ions into the processing volume, and a radio frequency (RF) power source configured to provide a symmetrical driving waveform on the first electrode and the second electrode to produce an anodic cycle and a cathodic cycle of the RPS, wherein the anodic cycle and the cathodic cycle operate in a hollow cathode effect mode.