Measuring a pattern
    1.
    发明授权

    公开(公告)号:US11449979B2

    公开(公告)日:2022-09-20

    申请号:US17067566

    申请日:2020-10-09

    Abstract: There is provided a method, a non-transitory computer readable medium, and a system for measuring a pattern. The method can include (a) obtaining an electron image of an area of a sample, the area comprises the pattern, the electron image comprises multiple lines; each line comprises information obtained by moving an electron beam over a scan line; (b) generating a converted image by applying a noise reduction kernel on the electron image, the noise reduction kernel has a width that represents a number of consecutive lines of the electron image; the width is determined based on relationships between analysis results obtained when using noise reduction kernels of different widths; and (c) analyzing the converted image to provide a pattern measurement.

    MEASURING A PATTERN
    2.
    发明申请

    公开(公告)号:US20220114721A1

    公开(公告)日:2022-04-14

    申请号:US17067566

    申请日:2020-10-09

    Abstract: There is provided a method, a non-transitory computer readable medium, and a system for measuring a pattern. The method can include (a) obtaining an electron image of an area of a sample, the area comprises the pattern, the electron image comprises multiple lines; each line comprises information obtained by moving an electron beam over a scan line; (b) generating a converted image by applying a noise reduction kernel on the electron image, the noise reduction kernel has a width that represents a number of consecutive lines of the electron image; the width is determined based on relationships between analysis results obtained when using noise reduction kernels of different widths; and (c) analyzing the converted image to provide a pattern measurement.

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