公开(公告)号：US09716239B2

公开(公告)日：2017-07-25

申请号：US15276377

申请日：2016-09-26

Applicant: ARIZONA BOARD OF REGENTS ON BEHALF OF ARIZONA STATE UNIVERSITY

Inventor： Bin Mu ,  Bohan Shan

IPC: C07F7/00 ,  H01L51/00

CPC classification number: H01L51/0084 ,  C07F7/003

Abstract: Some embodiments include a method of preparing a phototuned metal-organic framework by forming a first solution by dissolving ZrOCl2.8H2O in dimethylformamide (DMF) and formic acid, mixing and dissolving 1,4-phenylenediacrylic acid in a second solution of dimethylformamide (DMF) and trimethylamine, and at least partially mixing the first and second solutions to form a mixture. The method further includes sealing the mixture in an autoclave and heating the mixture to above ambient temperature for a specified period of time to prepare ZrPDA metal-organic framework, and extracting the ZrPDA metal-organic framework and at least partially reacting to a specified degree at least some of ZrPDA metal-organic framework through [2+2] cycloaddition reactions. The specified degree can be tunable based at least in part on at least one of the intensity of UV radiation, the exposure time, and the UV wavelength.

公开(公告)号：US20170092879A1

公开(公告)日：2017-03-30

申请号：US15276377

申请日：2016-09-26

Applicant: ARIZONA BOARD OF REGENTS ON BEHALF OF ARIZONA STATE UNIVERSITY

Inventor： Bin Mu ,  Bohan Shan

IPC: H01L51/00 ,  C07F7/00

CPC classification number: H01L51/0084 ,  C07F7/003

Abstract: Some embodiments include a method of preparing a phototuned metal-organic framework by forming a first solution by dissolving ZrOCl2.8H2O in dimethylformamide (DMF) and formic acid, mixing and dissolving 1,4-phenylenediacrylic acid in a second solution of dimethylformamide (DMF) and trimethylamine, and at least partially mixing the first and second solutions to form a mixture. The method further includes sealing the mixture in an autoclave and heating the mixture to above ambient temperature for a specified period of time to prepare ZrPDA metal-organic framework, and extracting the ZrPDA metal-organic framework and at least partially reacting to a specified degree at least some of ZrPDA metal-organic framework through [2+2] cycloaddition reactions. The specified degree can be tunable based at least in part on at least one of the intensity of UV radiation, the exposure time, and the UV wavelength.