Lithographic Apparatus and Method
    1.
    发明申请
    Lithographic Apparatus and Method 有权
    平版印刷设备和方法

    公开(公告)号:US20150370180A1

    公开(公告)日:2015-12-24

    申请号:US14762452

    申请日:2014-02-05

    IPC分类号: G03F7/20

    摘要: A support such as a clamp (310) is configured to releasably hold a patterning device such as a reticle (300) to secure it and prevent heat-induced deformation of it. For example, an electrostatic clamp includes a first substrate (312) having opposing first (313) and second (315) surfaces, a plurality of burls (316) located on the first surface and configured to contact the reticle, a second substrate (314) having opposing first (317) and second (319) surfaces. The first surface of the second substrate is coupled to the second surface of the first substrate. A plurality of cooling elements (318) are located between the first surface of the second substrate and the second surface of the first substrate. The cooling elements are configured to cause electrons to travel from the second surface of the first substrate to the first surface of the second substrate. Each cooling element is substantially aligned with a respective burl.

    摘要翻译: 诸如夹具(310)的支撑件构造成可释放地保持图案形成装置例如掩模版(300)以固定它并防止其热引起的变形。 例如,静电夹具包括具有相对的第一(313)和第二(315)表面的第一基底(312),位于第一表面上并被构造成接触光罩的多个毛刺(316),第二基底 )具有相对的第一(317)和第二(319)表面。 第二衬底的第一表面耦合到第一衬底的第二表面。 多个冷却元件(318)位于第二基板的第一表面和第一基板的第二表面之间。 冷却元件构造成使电子从第一衬底的第二表面行进到第二衬底的第一表面。 每个冷却元件基本上与相应的毛刺对齐。