公开(公告)号：US09983487B2

公开(公告)日：2018-05-29

申请号：US14947628

申请日：2015-11-20

Applicant: ASML Holding N.V. ,  ASML Netherlands B.V.

Inventor： Robert Gabriël Maria Lansbergen ,  George Hilary Harrold ,  Richard John Johnson ,  Hugo Jacobus Gerardus Van Der Weijden

IPC: G03F7/20 ,  H01L21/68

CPC classification number: G03F7/70741 ,  G03F7/70983 ,  H01L21/682

Abstract: Provided is a method and apparatus for moving and exchanging reticles within a vacuum lithographic system with minimum particle generation and outgassing. In an example of the method, a first arm of a rotational exchange device (RED) receives a first baseplate holding a first reticle. A second arm of the RED supports and buffers a second baseplate. The first and second baseplates are located substantially equidistant from an axis of rotation of the RED.

公开(公告)号：US11480885B2

公开(公告)日：2022-10-25

申请号：US17291302

申请日：2019-10-22

Applicant: ASML Holding N.V.

Inventor： James Hamilton Walsh ,  Richard John Johnson ,  Christopher Rossi Vann

IPC: G03F7/20

Abstract: An apparatus for and method of cleaning a surface of a support structure in a lithographic system in which a cleaning substrate has at least one motor which causes the cleaning substrate to move laterally across the surface. The cleaning substrate may be provided with a power supply mounted on the cleaning substrate and selectably electrically connectable to the motor.