公开(公告)号：US20230333462A1

公开(公告)日：2023-10-19

申请号：US18022508

申请日：2021-08-05

Applicant: ASML NETHERLANDS B. V.

Inventor： Ties Wouter VAN DER WOORD ,  Alexander Ludwig KLEIN ,  Zomer Silvester HOUWELING ,  Inci DONMEZ NOYAN ,  Volker Dirk HILDENBRAND ,  Adrianus Johannes Maria HILDENBRAND ,  Johan Hendrik GIESBERS

IPC: G03F1/62 ,  G03F1/80

CPC classification number: G03F1/62 ,  G03F1/80

Abstract: A pellicle membrane for use in a lithographic apparatus, the pellicle membrane characterized by in plane variation in composition is described. A method of manufacturing a pellicle membrane, the method including: providing a first material layer on a sacrificial layer on a substrate; providing a photoresist layer on the first material layer; patterning the photoresist layer; etching the first material layer to form a patterned surface; and either i) depositing a layer of a second material on the patterned surface and subsequently lifting off the portion of the second material deposited on the patterned photoresist layer, or ii) removing the remaining photoresist layer, depositing a layer of a second material on the patterned surface, and subsequently planarizing the surface.