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公开(公告)号：US20190072860A1
公开(公告)日：2019-03-07
申请号：US16115047
申请日：2018-08-28
Applicant: ASML NETHERLANDS B. V.
Inventor： Bastiaan Onne FAGGINGER AUER , Paul Christiaan HINNEN , Hugo Augustinus Joseph CRAMER , Anagnostis TSIATMAS , Mariya Vyacheslavivna MEDVEDYEVA
Abstract: A target formed on a substrate, the target having: an alignment structure; and a metrology structure; wherein the alignment structure comprises structures that are arranged to generate a beat pattern when the alignment structure is illuminated with source radiation. Advantageously, when the target is illuminated, the beat pattern that appears in an image of the target allows the target to be easily identified using a pattern recognition technique.
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