公开(公告)号：US20160363873A1

公开(公告)日：2016-12-15

申请号：US15250579

申请日：2016-08-29

Applicant: ASML NETHERLANDS B.V.

Inventor： Hans JANSEN ,  Marco Koert Stavenga ,  Jacobus Johannus Leonardus Hendricus Verspay ,  Franciscus Johannes Joseph Janssen ,  Anthorie Kuijper

IPC: G03F7/20

CPC classification number: G03F7/70858 ,  G03F7/2041 ,  G03F7/70341

Abstract: An immersion liquid is provided comprising an ion-forming component, e.g. an acid or a base, which has a relatively high vapor pressure. Also provided are lithography processes and lithography systems using the immersion liquid.