公开(公告)号：US11474436B2

公开(公告)日：2022-10-18

申请号：US16973732

申请日：2019-06-11

Applicant: ASML NETHERLANDS B.V.

Inventor： Bart Smeets ,  Anita Bouma ,  Johannes Jacobus Matheus Baselmans ,  Birgitt Noelle Cornelia Liduine Hepp ,  Paulus Hubertus Petrus Koller ,  Carsten Andreas Köhler

IPC: G03F7/20

Abstract: A method for tuning a target apparatus of a patterning process. The method includes obtaining a reference performance, and measurement data of a substrate subjected to the patterning process at the target apparatus, the measurement data indicative of a performance of the target apparatus; determining a cause of a performance mismatch based on a difference between the reference performance and the performance of the target apparatus, wherein the cause includes an optical characteristic; and responsive to the cause, adjusting an optical parameter associated with an adjustable optical characteristic to reduce the performance mismatch in the optical characteristic.