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公开(公告)号：US20240184254A1
公开(公告)日：2024-06-06
申请号：US18287613
申请日：2022-04-19
Applicant: ASML NETHERLANDS B.V.
Inventor： Roy WERKMAN , Sarathi ROY , Daan MANNEKE
CPC classification number: G05B13/027 , G03F7/705 , G03F7/70525
Abstract: A method for configuring a semiconductor manufacturing process, the method comprising: obtaining a plurality of first values of a first parameter based on successive measurements associated with a first operation of a process step in the semiconductor manufacturing process; using a causal convolutional neural network to determine a predicted value of a second parameter based on the first values; and using the predicted value of the second parameter in configuring a subsequent operation of the process step in the semiconductor manufacturing process.
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