公开(公告)号：US20230259037A1

公开(公告)日：2023-08-17

申请号：US18015522

申请日：2021-06-14

Applicant: ASML NETHERLANDS B.V.

Inventor： Cornelius Maria ROPS ,  Christianus Wilhelmus Johannes BERENDSEN ,  Erik Henricus Egidius Catharina EUMMELEN ,  Dagmar Antoinette WISMEIJER

IPC: G03F7/20 ,  B06B1/06

CPC classification number: G03F7/70341 ,  B06B1/0644

Abstract: A lithographic apparatus has a substrate holder configured to hold a substrate and a projection system configured to project a radiation beam onto the substrate held by the substrate holder. There is also a fluid handling system configured to confine immersion liquid to a space between a part of the projection system and a surface of the substrate so that the radiation beam can irradiate the surface of the substrate by passing through the immersion liquid. An excitation device is provided to generate surface acoustic waves in the substrate and propagating toward the immersion liquid.