公开(公告)号：US10296692B2

公开(公告)日：2019-05-21

申请号：US14577901

申请日：2014-12-19

Applicant: ASML NETHERLANDS B.V.

Inventor： Guangqing Chen ,  Justin Ghan ,  David Harold Whysong

IPC: G06F17/50 ,  G03F7/20 ,  G03F9/00

Abstract: A method of metrology target design is described. The method includes providing a range or a plurality of values for design parameter of a metrology target and by a processor, selecting, by solving for and/or sampling within the range or the plurality of values for the design parameters, a plurality of metrology target designs having one or more design parameters meeting a constraint for a design parameter of the metrology target.