公开(公告)号：US20190025714A1

公开(公告)日：2019-01-24

申请号：US16035961

申请日：2018-07-16

Applicant: ASML NETHERLANDS B.V.

Inventor： Maxim PISARENCO ,  Gerardus Martinus Maria VAN KRAAIJ ,  Sebastianus Adrianus GOORDEN

IPC: G03F7/20 ,  G01N21/88 ,  G01N21/47

Abstract: Methods and apparatuses for estimation of at least one parameter of interest of a feature fabricated on a substrate, the feature having a plurality of structure parameters, the structure parameters including the at least one parameter of interest and one or more nuisance parameters. A receiver receives radiation scattered from one or more measured features on the substrate. A pupil generator generates an unprocessed pupil representation of the received radiation. A matrix multiplier multiplies a transformation matrix with intensities of each of a plurality of pixels of the unprocessed pupil representation to determine a post-processed pupil representation in which effects of the one or more nuisance parameters are mitigated or removed. A parameter estimator estimates the at least one parameter of interest based on the post-processed pupil representation.