公开(公告)号：US20220091514A1

公开(公告)日：2022-03-24

申请号：US17424991

申请日：2019-12-18

Applicant: ASML NETHERLANDS B.V.

Inventor： Roy WERKMAN ,  David Frans Simon DECKERS ,  Bijoy RAJASEKHARAN ,  Ignacio Salvador VAZQUEZ RODARTE ,  Sarathi ROY

IPC: G03F7/20 ,  G05B13/02

Abstract: A method of determining a control parameter for a lithographic process is disclosed, the method includes: defining a substrate model for representing a process parameter fingerprint across a substrate, the substrate model being defined as a combination of basis functions including at least one basis function suitable for representing variation of the process parameter fingerprint between substrates and/or batches of substrates; receiving measurements of the process parameter across at least one substrate; calculating substrate model parameters using the measurements and the basis functions; and determining the control parameter based on the substrate model parameters and the similarity of the at least one basis function to a process parameter fingerprint variation between substrates and/or batches of substrates.