专利检索 ap:("ASML NETHERLANDS B.V.") AND inv:"István NAGY" 第 1 页

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发明申请
METHOD OF DETERMINING A MARK MEASUREMENT SEQUENCE, STAGE APPARATUS AND LITHOGRAPHIC APPARATUS 有权

公开(公告)号：US20220260933A1

公开(公告)日：2022-08-18

申请号：US17628959

申请日：2020-07-16

申请人： ASML NETHERLANDS B.V.

发明人： István NAGY , Özer DUMAN , Arjan GIJSBERTSEN , Pieter Jacob HERES , Rudolf Michiel HERMANS , Erik JANSEN , Thomas Augustus MATTAAR , Norbertus Josephus Martinus VAN DEN NIEUWELAAR , Petrus Franciscus VAN GILS

IPC分类号： G03F9/00

摘要： A method of determining a mark measurement sequence for an object comprising a plurality of marks, the method including: receiving location data for the plurality of marks that are to be measured; obtaining a boundary model of a positioning device used for performing the mark measurement sequence; and determining the mark measurement sequence based on the location data and the boundary model.