公开(公告)号：US10599040B2

公开(公告)日：2020-03-24

申请号：US16040808

申请日：2018-07-20

Applicant: ASML NETHERLANDS B.V.

Inventor： James Malcolm Weidman ,  Franciscus Johannes Blok ,  Erika Jane Prime ,  Juliane Charlotte Behrend

IPC: G03B27/54 ,  G03F7/20

Abstract: A method of determining compatibility of a patterning device with a lithographic apparatus. The method includes determining an intensity distribution of a conditioned radiation beam across a sensor plane of an illumination system of the lithographic apparatus. The method further includes using the determined intensity distribution to calculate a non-uniformity of intensity caused by contamination and/or degradation of a collector. The method further includes determining the effect of the non-uniformity on a characteristic of an image of the patterned radiation beam. The method further includes determining the compatibility of the patterning device with the lithographic apparatus based on the effect of the non-uniformity on the characteristic.