公开(公告)号：US20220187786A1

公开(公告)日：2022-06-16

申请号：US17601307

申请日：2020-03-19

Applicant: ASML NETHERLANDS B.V.

Inventor： Marc HAUPTMANN ,  Amir Bin ISMAIL ,  Rizvi RAHMAN ,  Jiapeng LI

IPC: G05B19/404 ,  G03F7/20

Abstract: A method for generating a sampling scheme for a device manufacturing process, the method including: obtaining a measurement data time series of a plurality of processed substrates; transforming the measurement data time series to obtain frequency domain data; determining, using the frequency domain data, a temporal sampling scheme; determining an error offset introduced by the temporal sampling scheme on the basis of measurements on substrates performed according to the temporal sampling scheme; and determining an improved temporal sampling scheme to compensate the error offset.