公开(公告)号：US20220163896A1

公开(公告)日：2022-05-26

申请号：US17600631

申请日：2020-04-07

Applicant: ASML NETHERLANDS B.V.

Inventor： Nirupam BANERJEE ,  Johan Franciscus Maria BECKERS ,  Peter BRAKHAGE ,  Arend Johannes DONKERBROEK ,  Daniel GRIMM ,  Tim RATHJE ,  Martin TILKE ,  Sandro WRICKE

IPC: G03F7/20 ,  C23C14/34 ,  C23C14/58 ,  C23C16/455

Abstract: An image sensor for immersion lithography, the image sensor including: a grating; an absorber layer on the grating, the absorber layer configured to absorb radiation; and a liquidphobic coating at an upper surface of the image sensor, wherein a protective layer is provided between the absorber layer and the liquidphobic layer, the protective layer being less reactive than the absorber layer to an immersion liquid.